The lab operates a dedicated nanofabrication suite that supports rapid iteration from device design to working prototype. Patterns are defined by photolithography, transferred into the substrate by reactive-ion etching (RIE), and metal contacts and plasmonic layers are deposited by e-beam evaporation. Suspended micro/nanostructures are dried in a critical-point dryer to avoid stiction, and finished devices are inspected by field-emission SEM.
Hands-on access to this full process line means students can close the design → fabricate → measure loop entirely within the group, rather than queueing for shared facilities.
Left: Transfer system. Right: Wet station.